Zpulser Arcus is an industry proven and patented high power pulsed arc solution based on Zpulserʼs innovative HIPIMS/HPPMS pulsed plasma technology.
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Recommended for all type of high power arc discharge applications such as: Metal, Conductive Reactive Sputtering and Non-Conductive Reactive Sputtering (Al2O3, ALN…ETC), DLC
Create new and improved materials
Zpulser Arcus allows users to generate and control pulsed current during the arc deposition process by controlling voltage rise time and voltage oscillation frequency to produce smoother interface and lower stress films.
Reactive mode deposition
Zpulser Arcus creates highly reactive plasma that allows users to deposit in a reactive (oxides and nitrides) environment (conductive and non-conductive layers) with high evaporation rates.
High yield and throughput
Zpulser Arcus offers control over voltage rise time and voltage oscillations to improve arc current discharge, reduce macro particles and improve ionization during the deposition process. This feature enables users to produce high-quality layers at high throughput.
Zpulser Arcus has a simple, user-friendly interface that allows users to easily adjust both the ionization and the deposition rates during the arc discharge process.