Zpulser generators can be used in various markets and product types. The Company’s goal is to help its customers be the leaders in their market category using Zpulser generators. To see if a Zpulser generator can make a difference in your market, please email with your application and requirements for review by the Zpulser team.

Zpulser Arcus™

Zpulser Arcus is an industry proven and patented high power pulsed arc solution based on Zpulserʼs innovative HIPIMS/HPPMS pulsed plasma technology.

Please call 508-618-1266 or email for sales inquiry


Peak Pulse Current up to 2000 Amps

Average Power 3 to 28 kW continuous

Macro-Pulse Length 3 to 3000 μsec

Pulse Frequency 1 to 62.5 kHz

Pulse Type Patent pending negative unipolar with voltage rise control to achieve high power pulsed discharge in reactive and non-reactive sputtering with the most and fastest arc suppression circuit on the market

Open Voltage 300 V, 400 V, 600 V, 800 V, 1000 V

Remote Interface RS232, Ethernet (Standard) Optional: PLC, Profibus or Devicenet

Input Voltage Options 3ɸ: 208, 400, and 480 V

Input Voltage Options Air & Water


Recommended for all type of high power arc discharge applications such as: Metal, Conductive Reactive Sputtering and Non-Conductive Reactive Sputtering (Al2O3, ALN…ETC), DLC

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Create new and improved materials

Zpulser Arcus allows users to generate and control pulsed current during the arc deposition process by controlling voltage rise time and voltage oscillation frequency to produce smoother interface and lower stress films.

Reactive mode deposition

Zpulser Arcus creates highly reactive plasma that allows users to deposit in a reactive (oxides and nitrides) environment (conductive and non-conductive layers) with high evaporation rates.

High yield and throughput

Zpulser Arcus offers control over voltage rise time and voltage oscillations to improve arc current discharge, reduce macro particles and improve ionization during the deposition process. This feature enables users to produce high-quality layers at high throughput.

User-friendly interface

Zpulser Arcus has a simple, user-friendly interface that allows users to easily adjust both the ionization and the deposition rates during the arc discharge process.

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