Zpulser AXIA is an industry proven and patented pulsed DC HIPIMS/HPPMS solution based on Zpulserʼs innovative pulsed plasma technology.
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Recommended for most types of high power sputtering applications such as: Metal, Conductive Reactive Sputtering and Non-Conductive Reactive Sputtering such as AL2O3 (possible), DLC & ITO
Create new and improved materials
Zpulser AXIA allows users to generate and control the metal ion fraction during the magnetron sputtering process to deposit low stress, extremely dense and excellent adhesion thin films to meet the most demanding applications.
Reactive mode sputtering
Zpulser AXIA creates highly reactive plasma that allows users to sputter in a reactive environment with high deposition rates with the most advanced arc suppression circuit without the need for a positive reversal pulse.
High yield and throughput
Zpulser AXIA offers the most advanced arc suppression system that minimizes the generation of macro particles during the sputtering process. This feature enables users to produce high-quality films at high throughput.
Zpulser AXIA has a simple, user-friendly interface that allows users to easily program and operate the HIPIMS/HPPMS generator.