Zpulser Cyprium™ is an industry proven and patented HIPIMS/HPPMS solution based on Zpulserʼs innovative pulsed plasma technology.
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Recommended for all type of high power sputtering such as: Metal, Conductive Reactive Sputtering and Non-Conductive Reactive Sputtering (Al2O3, ALN…ETC), DLC & ITO
Create new and improved materials
Zpulser Cyprium allows users to generate and control the metal ion fraction during the magnetron sputtering process to deposit low stress, extremely dense and excellent adhesion thin films to meet the most demanding applications.
Reactive mode sputtering
Zpulser Cyprium creates highly reactive plasma that allows users to sputter in a reactive environment with high deposition rates in near arc free discharge without the need for a positive reversal pulse.
High yield and throughput
Zpulser Cyprium offers an advanced arc suppression system that minimizes the generation of macro particles during the sputtering process. This feature enables users to produce high-quality films at high throughput.
Zpulser Cyprium has a simple, user-friendly interface that allows users to easily program and operate the HIPIMS/HPPMS generator.