Zpulser generators can be used in various markets and product types. The Company’s goal is to help its customers be the leaders in their market category using Zpulser generators. To see if a Zpulser generator can make a difference in your market, please email with your application and requirements for review by the Zpulser team.

Zpulser Cyprium™

Zpulser Cyprium™ is an industry proven and patented HIPIMS/HPPMS solution based on Zpulserʼs innovative pulsed plasma technology.

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Peak Pulse Power 0.17 to 1.7 Megawatts

Average Power 12, 22, 28 to 152 kW

Pulse Length 2 to 16 μsec

Pulse Frequency 1 to 62.5 kHz

Pulse Type Patented negative unipolar with voltage rise control to achieve near arc free discharge in reactive and non-reactive sputtering

Peak Pulse Current 100 to 1000 A

Peak Pulse Voltage 1200 V

Open Pulse Voltage 1500 V

Remote Interface RS232, Ethernet (Standard) Optional: PLC, Profibus or Devicenet

Input Voltage Options 3ɸ: 208, 400, and 480 V

Cooling Air & Water


Recommended for all type of high power sputtering such as: Metal, Conductive Reactive Sputtering and Non-Conductive Reactive Sputtering (Al2O3, ALN…ETC), DLC & ITO

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Create new and improved materials

Zpulser Cyprium allows users to generate and control the metal ion fraction during the magnetron sputtering process to deposit low stress, extremely dense and excellent adhesion thin films to meet the most demanding applications.

Reactive mode sputtering

Zpulser Cyprium creates highly reactive plasma that allows users to sputter in a reactive environment with high deposition rates in near arc free discharge without the need for a positive reversal pulse.

High yield and throughput

Zpulser Cyprium offers an advanced arc suppression system that minimizes the generation of macro particles during the sputtering process. This feature enables users to produce high-quality films at high throughput.

User-friendly interface

Zpulser Cyprium has a simple, user-friendly interface that allows users to easily program and operate the HIPIMS/HPPMS generator.

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