Zpulser Vesta is a DC bias supply solution for high-power pulsed plasma magnetron or arc discharge that comes with a built-in arc suppression circuit to prevent the loss or significant drop of bias voltage during high power pulsing.
Please call 508-618-1266 or email firstname.lastname@example.org for sales inquiry
Recommended for all type of high power etch applications as well as Metal, Conductive thin film deposition.
Designed for high-power pulse discharge
Zpulser Vesta allows users to control the bias voltage during high-power pulsed magnetron or arc discharge processes.
High yield and throughput
Zpulser Vesta offers an advanced arc suppression circuit that eliminates arcing while biasing a substrate during high-power pulsed magnetron or arc discharge processes. This feature enables users to control ion energy delivered to the substrate to produce extremely dense, low stress and great adhesion thin films.
Zpulser Vesta has a simple, user-friendly interface.
ZPULSER CUSTOM HIPIMS/HPPMS GENERATORS
Our team has over a decade of high pulse power knowledge and we are willing to work on a confidential basis to offer our clients a custom HIPIMS/HPPMS solution to meet specific needs and help lower R&D cost and time to market.
Start this process by contacting us at the following address: email@example.com with a general inquiry.