Zpulser has assembled various White Papers that address some of the key issues facing the many markets it serves. They offer an ideal opportunity to study important industry topics and trends. Please read and share any that you find applicable to your specific situation.
Recent Advances in Modulated Pulsed Power Magnetron Sputtering for Surface Engineering | June 20, 2011
Over the past 10 years, the development of high-power pulsed magnetron sputtering (HPPMS) has shown considerable potential in improving the quality of sputtered films by generating a high degree of ionization of the sputtered species to achieve high plasma density by using pulsed, high peak target power for a short period of time.
Study of plasma dynamics in a modulated pulsed power magnetron discharge using a time-resolved Langmuir probe | February 1, 2011
Modulated pulse power MPP technology is a derivative of high power pulsed magnetron sputtering that allows unprecedented user control over the growth process, although the critical time-dependent plasma properties during the power pulse have not been studied until now. Using a MPP plasma generator, pulses of custom voltage waveforms were generated and applied to the cathode of a 36 cm diameter circular planar magnetron.
Deposition rate characteristics for steady state high power impulse magnetron sputtering (HIPIMS) discharges generated with a modulated pulsed power (MPP) generator | January 1, 2011
High power impulse magnetron sputtering (HIPIMS) pulses have been of great interest over the last decade. With such sputtering techniques a substantial amount of target material can be ionized and used for the engineering of surfaces and coatings.
High rate deposition of thick CrN and Cr2N coatings using modulated pulse power (MPP) magnetron sputtering | November 16, 2010
As a variation of high power pulsed magnetron sputtering technique, modulated pulse power (MPP) magnetron sputtering can achieve a high deposition rate while at the same time achieving a high degree of ionization of the sputtered material with lowion energies.
Time-resolved plasma characterisation of modulated pulsed power magnetron sputtering of chromium | September 14, 2010
Time-resolved Langmuir probe measurements have been employed to investigate the temporal development of the plasma properties, such as electron and ion density, electron temperature as well as the floating and plasma potential, during Modulated Pulsed Power Magnetron Sputtering (MPPMS).
Effect of Negative Substrate Bias on the Structure and Properties of Ta Coatings Deposited Using Modulated Pulse Power Magnetron Sputtering | February 9, 2010
Crystalline phase control is critical for obtaining desired structure and properties of Ta coatings deposited by magnetron sputtering. We have shown the approach to control the alpha and beta Ta phase formations by tuning the negative substrate bias voltage during modulated pulse power (MPP) magnetron sputtering, which generates a large fraction of targetmetallic ions in the plasma providing enhanced ion bombardment on the growing film.
Advances in Thin Film Technology through the Application of Modulated Pulse Power Sputtering | January 12, 2010
High power pulsed magnetron sputtering (HPPMS) is an emerging thin film deposition technology that generate high ionization plasma by applying a very large amount of peak power to a sputtering target for a short period of time.
Modulated pulse power sputtered chromium coatings | October 6, 2009
Cr coatings were deposited using continuous dc magnetron sputtering (dcMS) and modulated pulse power sputtering (MPP) techniques in a closed field unbalanced magnetron sputtering system at equivalent
average target powers. It was found that MPP sputtering exhibited higher deposition rates than in dcMS when the average target power density was above 14Wcm−2 for the Cr coating depositions. Plasma
diagnostics confirmed a significant increase in the numbers of both target material (Cr) and gas (Ar) ions in the MPP plasma as compared to the dc plasma.
The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering | August 12, 2009
The time averaged ion energy distributions and ion fluxes of continuous dcmagnetron sputtering (dcMS), middle frequency pulsed dc magnetron sputtering (PMS), and modulated pulse power (MPP) magnetron sputtering plasmas were compared during sputtering of a Cr target in an Ar/N2 atmosphere in a closed field unbalanced magnetron sputtering system.
Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering | March 6, 2009
Modulated pulse power (MPP) sputtering is a variation of high power pulsed magnetron sputtering (HPPMS) that overcomes the rate loss issue and achieves enhanced plasma ionization through modulation of the pulse shape, intensity, and duration. In this study, the principle and characteristics of MPP/HPPMS technique are first introduced.